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A Study on a Relationship Between Sputtering Condition and Electrochemical Property of Molybdenum Thin Films in Phosphoric Acid Solution File

Seo, Bo-Hyun , Kim, Hongsik , Choe, HeeHwan , Jeon, Jae-Hong , Winkler, Joerg , Lee, Yonguk , Kim, Soo-Hyun , Seo, Jong Hyun

Article Issue Date2016-04 View6
A Study on Chemical and Mechanical Properties of NiCrSn Films for Flexible Copper Interconnect File

Park, In-Sun , Kim, Hongsik , Kim, Byoung O. , Choe, HeeHwan , Jeon, Jae-Hong , Ahn, Joongkyu , Kim, Soo-Hyun , Seo, Jong Hyun

Article Issue Date2016-04 View6
Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant File

Jung, Jae-Hun , Lee, Seung-Joon , Lee, Hyun-Jung , Lee, Min Young , Cheon, Taehoon , Bae, So Ik , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , et al

Article Issue Date2015-11 View3
Effects of Ultra-Violet Wet Annealing on Electrical Performance of Back Channel Etching Cu/Mo/IGZO 4 Mask Thin Film Transistor File

Kim, Jeong-Hyun , Kim, Seung-Won , Kim, Byoung O. , Kim, Soo-Hyun , Seo, Jong Hyun

Article Issue Date2016-11 View3
Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization File

Choi, Sang-Kyung , Kim, Hangil , Kim, Junbeam , Cheon, Taehoon , Seo, Jong Hyun , Kim, Soo-Hyun

Article Issue Date2015-09 View2
Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen File

Yeo, Seungmin , Park, Ji-Yoon , Lee, Seung-Joon , Lee, Do-Joong , Seo, Jong Hyun , Kim, Soo-Hyun

Article Issue Date2015-04 View4
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